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Metal surface treatment process-part-2

2022-07-12

chemical surface heat treatment
 
Chemical heat treatment is a heat treatment process in which the workpiece is placed in a specific medium for heating and heat preservation, so that the active atoms in the medium penetrate into the surface layer of the workpiece, thereby changing the chemical composition and structure of the surface layer of the workpiece, and then changing its performance. Chemical heat treatment is also one of the methods to obtain the toughness of the surface, hard and lining. Compared with surface quenching, chemical heat treatment not only changes the surface structure of steel, but also changes its chemical composition. According to the different elements infiltrated, chemical heat treatment can be divided into carburizing, nitriding, multi-infiltration, infiltration of other elements, etc. The chemical heat treatment process includes three basic processes: decomposition, absorption, and diffusion.
 
Commonly used chemical heat treatment:
Carburizing, nitriding (commonly known as nitriding), carbonitriding (commonly known as cyanidation and soft nitriding), etc. Sulfurizing, boronizing, aluminizing, vanadizing, chromizing, etc.

metal coating

Coating one or more metal coatings on the surface of the base material can significantly improve its wear resistance, corrosion resistance and heat resistance, or obtain other special properties. There are electroplating, chemical plating, composite plating, infiltration plating, hot dip plating, vacuum evaporation, spray plating, ion plating, sputtering and other methods.
 
Metal Carbide Coating - Vapor Deposition
Vapor deposition technology refers to a new type of coating technology that deposits vapor-phase substances containing deposition elements on the surface of materials by physical or chemical methods to form thin films.
According to the principle of deposition process, vapor deposition technology can be divided into two categories: physical vapor deposition (PVD) and chemical vapor deposition (CVD).
 
Physical Vapor Deposition (PVD)
 
Physical vapor deposition refers to a technology in which a material is vaporized into atoms, molecules or ionized into ions by physical methods under vacuum conditions, and a thin film is deposited on the surface of the material through a gas phase process.
Physical deposition technology mainly includes three basic methods: vacuum evaporation, sputtering, and ion plating.
Physical vapor deposition has a wide range of applicable substrate materials and film materials; the process is simple, material-saving, and pollution-free; the obtained film has the advantages of strong adhesion to the film base, uniform film thickness, compactness, and fewer pinholes.
 
Chemical Vapor Deposition (CVD)
 
Chemical vapor deposition refers to a method in which a mixed gas interacts with the surface of a substrate at a certain temperature to form a metal or compound film on the surface of the substrate.
 
Because the chemical vapor deposition film has good wear resistance, corrosion resistance, heat resistance and electrical, optical and other special properties, it has been widely used in machinery manufacturing, aerospace, transportation, coal chemical industry and other industrial fields.